Stability of AlGaN/GaN heterostructures after hydrogen plasma treatment

0473944 - FZÚ 2018 RIV NL eng J - Článek v odborném periodiku
Babchenko, O. - Dzuba, J. - Lalinský, T. - Vojs, M. - Vincze, A. - Ižák, Tibor - Vanko, G.
Stability of AlGaN/GaN heterostructures after hydrogen plasma treatment.
Applied Surface Science. Roč. 395, Feb (2017), s. 92-97. ISSN 0169-4332. E-ISSN 1873-5584
Grant CEP: GA ČR(CZ) GP14-16549P
Grant ostatní: AV ČR(CZ) SAV-16-02
Program: Bilaterální spolupráce
Institucionální podpora: RVO:68378271
Klíčová slova: AIGaN/GaN heterostructure * hydrogen plasma * SIMS * TLM * HEMT
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 4.439, rok: 2017

We report on the investigation of low temperature (300 degrees C) hydrogen plasma treatment influence on the AlGaN/GaN heterostructures. This issue was raised in the frame of study on processes related to hybrid integration of diamond with GaN-based devices. At the same time, the capabilities of thin SiNx covering were investigated. The samples were exposed to low pressure hydrogen plasma ignited in the linear plasma system at low temperature. We analyze the surface morphology of samples by scanning electron microscopy while microstructural changes down to AlGaN/GaN interface were studied using secondary ion mass spectrometry. The sheet resistance, monitored using circular transmission line measurements, increases more than 3.5 times after 60 min treatment. The basic transport properties of the fabricated circular high electron mobility transistors after H-2 plasma treatment were analyzed. The sheet resistance increasing was attributed to the decrease of effective mobility. Whilst, the observed Schottky barrier lowering indicates necessity of gate contact protection.
Trvalý link: http://hdl.handle.net/11104/0271045