Scanning Thermal Microscopy of Thermoelectric Nanostructures

0469517 - ÚFE 2017 RIV US eng J - Článek v odborném periodiku
Vaniš, Jan - Zelinka, J. - Zeipl, R. - Jelínek, M. - Kocourek, T. - Remsa, J. - Navrátil, J.
Scanning Thermal Microscopy of Thermoelectric Nanostructures.
Journal of Electronic Materials. Roč. 45, č. 3 (2016), s. 1734-1739. ISSN 0361-5235. E-ISSN 1543-186X
Institucionální podpora: RVO:67985882
Klíčová slova: secondary ion mass spectrometry * laser deposition * pulsed laser deposition
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
Impakt faktor: 1.579, rok: 2016

We present the development and results of a new simple method for thermal conductivity characterization of thin films and thermoelectric structures using a scanning thermal microscope in pulsed current mode. The presented method does not allow measurement of absolute thermal conductivity of the studied system, but only relative to the Si substrate. We present the results of the method on the Si substrate/layer step boundary. The nano-layers of different thickness and different materials were prepared for the experiments by the pulsed laser deposition from hot-pressed targets
Trvalý link: http://hdl.handle.net/11104/0267303