Plasma cleaning effect on the stability of the Epon resin sections

0465340 - ÚPT 2017 RIV GB eng C - Konferenční příspěvek (zahraniční konf.)
Skoupý, Radim - Krzyžánek, Vladislav - Nebesářová, Jana
Plasma cleaning effect on the stability of the Epon resin sections.
EMC2016. The 16th European Microscopy Congress. Proceedings. Oxford: Wiley, 2016, s. 597-598. ISBN 9783527808465.
[EMC2016. European Microscopy Congress /16./. Lyon (FR), 28.08.2016-02.09.2016]
Grant CEP: GA ČR(CZ) GA14-20012S; GA TA ČR(CZ) TE01020118; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institucionální podpora: RVO:68081731 ; RVO:60077344
Klíčová slova: STEM * plasma cleaning
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika; JA - Elektronika a optoelektronika, elektrotechnika (BC-A)
http://onlinelibrary.wiley.com/doi/10.1002/9783527808465.EMC2016.5995/pdf

Low voltage TEM and STEM (transmission and scanning transmission electron microscope) can be regarded as the method of choice for many structural studies of very thin biological samples like ultrathin sections, viruses etc. Unfortunately, the specimen contamination increases with electron flux and therefore a specimen cleanliness is an important factor in obtaining of valuable data especially in STEM. An important parameter for imaging of those samples is a sensitivity of the sample to degradation by electron beam. The mass loss indicates a degree of the radiation damage. We investigated the mass loss of embedding medium (Epon resin of middle hardness) in combination of different thickness of the sections (60 nm and 150 nm) with using or not-using of plasma cleaning which is often used to removing of contamination from the sample.
Trvalý link: http://hdl.handle.net/11104/0263960