Combined e-beam lithography using different energies

0463775 - ÚPT 2017 AT eng C - Konferenční příspěvek (zahraniční konf.)
Krátký, Stanislav - Kolařík, Vladimír - Horáček, Miroslav - Meluzín, Petr - Král, Stanislav
Combined e-beam lithography using different energies.
MNE. 42nd International Conference on Micro and Nano Engineering. Viena: Mondial, 2016.
[Interantional Conference on Micro and Nano Engineering /42./. Vienna (AT), 19.09.2016-23.09.2016]
Grant CEP: GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institucionální podpora: RVO:68081731
Klíčová slova: e-beam lithography * absorbed energy density * micro-optical elements
Kód oboru RIV: BH - Optika, masery a lasery

This contribution deals with the possibilities of combined exposure of e-beam systems working with significant difference of primary electron energies (Vistec EBPG5000+ ES – 100keV, Tesla BS600 – 15keV). Variation of primary electron energies means the difference of absorbed energy density in electron resist. It allows us to find such wet developers that develop patterns from both systems independently (if the right order of
procedures is kept). This solution is very interesting for preparing of very complex optical elements without limitation of each system.
Trvalý link: http://hdl.handle.net/11104/0262858