Large-area gray-scale structures in e-beam writer versus area current homogeneity and deflection uniformity

0460202 - ÚPT 2017 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Kolařík, Vladimír - Horáček, Miroslav - Matějka, Milan - Krátký, Stanislav - Bok, Jan
Large-area gray-scale structures in e-beam writer versus area current homogeneity and deflection uniformity.
Proceedings of the 15th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Brno: Institute of Scientific Instruments CAS, 2016 - (Mika, F.), s. 26-27. ISBN 978-80-87441-17-6.
[International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /15./. Skalský dvůr (CZ), 29.05.2016-03.06.2016]
Grant CEP: GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institucionální podpora: RVO:68081731
Klíčová slova: e-beam writer * Gaussian e-beam writing system
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
http://www.trends.isibrno.cz/

The high stability and good current homogeneity in the spot of the e-beam writer is crucial to the exposure quality, particularly in the case of large-area structures when gray-scale lithography is used. Even though the deflection field distortion is calibrated regularly and beam focus and beam astigmatism is dynamically corrected over the entire deflection field,
we can observe disturbances in the exposed relief for both nowadays types of e-beam writers, the shaped e-beam writing system and the Gaussian e-beam writing system. A stable and homogeneous angular current density distribution in the spot is important especially in the case of shaped e-beam lithography systems. A non-homogeneity of the spot over deflection field is seen alongside the field boundaries of both lithography systems.
Trvalý link: http://hdl.handle.net/11104/0260334