Effect of nitrogen content on the mechanical properties of amorphous SiCN films

0452834 - FZÚ 2016 RIV CH eng C - Konferenční příspěvek (zahraniční konf.)
Čtvrtlík, Radim - Kulikovsky, V. - Tomáštík, J.
Effect of nitrogen content on the mechanical properties of amorphous SiCN films.
Key Engineering Materials, Vol. 662. Pfafficon: Trans Tech Publications Ltd, 2015 - (Kovalčíková, A.; Lofaj, F.), s. 95-98. ISBN 978-3-03835-555-7. ISSN 1013-9826.
[Conference on Local Mechanical Properties (LMP 2014) /11./. Stará Lesná (SK), 12.11.2014-14.11.2014]
Grant CEP: GA TA ČR TA03010743
Institucionální podpora: RVO:68378271
Klíčová slova: creep * elastic modulus * hardness * mechanical properties * SiCN thin films
Kód oboru RIV: JH - Keramika, žáruvzdorné materiály a skla

Amorphous silicon carbonitride (a-SiCxNy) thin films were deposited using reactive magnetron sputtering of SiC target in the mixture of Ar and N gasses. The films with nitrogen content from 0 - 40 at.% were sputtered at various N2/Ar flow ratios in the range of 0 - 0.48. The as deposited films were additionally annealed in argon at 700 °C and vacuum at 900 °C. Analysis of mechanical properties was performed using the regular nanoindentation and short duration nanoindentation creep test (600 s).Hardness of the a-SiCxNy films increases with the decrease of nitrogen content from approx. 19 GPa (a-Si30C30N40) to 22 GPa (a-SiC). Annealing of the films in inert atmosphere or vacuum leads to the increase of both the hardness and the elastic modulus. This increase is more pronounced for the SiC film than for the SiCN films. The nanoindentation creep test (600 s) showed that the rate of the steady-state creep growths with the increase of nitrogen content.
Trvalý link: http://hdl.handle.net/11104/0253738