Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films

0439961 - FZÚ 2015 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Olejníček, Jiří - Hubička, Zdeněk - Kohout, Michal - Kšírová, Petra - Brunclíková, Michaela - Kment, Štěpán - Čada, Martin - Darveau, S.A. - Exstrom, C.L.
Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films.
IEEE Photovoltaic Specialist Conference (PVSC 2014) /40./. New York: IEEE, 2014, s. 1666-1669. ISBN 9781479943982.
[IEEE Photovoltaic Specialist Conference (PVSC 2014) /40./. Denver (US), 08.06.2014-13.06.2014]
Grant CEP: GA MŠMT LH12045
Institucionální podpora: RVO:68378271
Klíčová slova: CIGS * HiPIMS * emission spectroscopy * magnetron sputtering * thin films
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech

CuIn1-xGaxSe2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic precursors. Thin film characteristics were measured using X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy, energy-dispersive X-ray spectroscopy (EDX) and other techniques.
Trvalý link: http://hdl.handle.net/11104/0243133