High-power pulsed plasma deposition of hematite photoanode for PEC water splitting

0438772 - FZÚ 2015 RIV NL eng J - Článek v odborném periodiku
Kment, Š. - Hubička, Zdeněk - Krysa, J. - Olejníček, Jiří - Čada, Martin - Gregora, Ivan - Zlámal, M. - Brunclíková, Michaela - Remeš, Zdeněk - Liu, N. - Wang, L. - Kirchgeorg, R. - Lee, Ch.Y. - Schmuki, P.
High-power pulsed plasma deposition of hematite photoanode for PEC water splitting.
Catalysis Today. Roč. 230, Jul (2014), 8-14. ISSN 0920-5861. E-ISSN 1873-4308
Grant CEP: GA ČR GAP108/12/2104; GA MŠMT LH12043
Institucionální podpora: RVO:68378271
Klíčová slova: electrical properties * hematite * HiPIMS * hollow cathode plasma jet * photoelectrochemical water splitting * thin films
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 3.893, rok: 2014

The fabrication of crystalline Alpha-Fe2O3 hematite thin films by means of novel high power impulse magnetron sputtering (HiPIMS) and high power hollow cathode plasma jets system is reported. The coatings are based on low temperature pulsed-plasma reactive sputtering. These methods were compared with a more common method of medium frequency pulsed reactive DC magnetron sputtering. Although both high power methods yielded crystalline structure of the films already during the depositions, the films had to be thermally treated at elevated temperature in order to improve their physical and electronic properties. The deposition methods used and the effect of the post deposition thermal annealing were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, electronic properties, and electrical behavior. The functional properties were investigated under simulated photoelectrochemical water splitting conditions.
Trvalý link: http://hdl.handle.net/11104/0242136