Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery

0438739 - FZÚ 2015 RIV CH eng J - Článek v odborném periodiku
Mistrík, J. - Janíček, P. - Taylor, Andrew - Fendrych, František - Fekete, Ladislav - Jäger, Aleš - Nesládek, M.
Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery.
Thin Solid Films. Roč. 571, č. 1 (2014), s. 230-237. ISSN 0040-6090. E-ISSN 1879-2731
Grant CEP: GA ČR GA13-31783S; GA MŠMT(CZ) LM2011026
Grant ostatní: COST Nano TP(XE) MP0901; OP VK(XE) CZ.1.07/2.3.00/20.0306
Institucionální podpora: RVO:68378271
Klíčová slova: nanocrystalline diamond * thin films * microwave plasma-enhanced chemical vapor deposition * pulsed plasma * low deposition temperature
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.759, rok: 2014

A series of nanocrystalline diamond (NCD) films were deposited by a custom made microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery at different substrate temperatures (520–600 °C) and pulsed plasma frequencies (2.7–14.3 kHz) in a hydrogen rich working gas mixture of H2/CH4/CO2. Films were deposited onto naturally oxidized Si wafers pre-seeded with nanodiamond particles. Spectroellipsometry characterization of the NCD films was carried out considering various model structures (single and bi-layer models) and various NCD optical constant parameterizations (Tauc–Lorentz and effective medium approximation with different non-diamond component representations).
Trvalý link: http://hdl.handle.net/11104/0242112