Nanodiamond seeding of rough substrates

0433409 - FZÚ 2015 RIV CZ eng K - Konferenční příspěvek (tuzemská konf.)
Vlčková, M. - Stefanovič, M. - Petrák, V. - Fendrych, František - Taylor, Andrew - Fekete, Ladislav - Nesládek, M.
Nanodiamond seeding of rough substrates.
Instruments and methods for biology and medicine 2011, Conference proceedings. Prague: Czech Technical University in Prague, 2011 - (Pospíšilová, M.; Vrbová, M.; Macháň, R.), s. 11-15. ISBN 978-80-01-04915-0.
[Instruments and Methods for Biology and Medicine 2011. Kladno (CZ), 02.06.2011-02.06.2011]
Grant CEP: GA MŠMT(CZ) LD11076; GA AV ČR KAN200100801; GA AV ČR(CZ) KAN400480701
GRANT EU: European Commission(XE) 238201 - MATCON
Grant ostatní: COST Nano TP(XE) MP0901
Institucionální podpora: RVO:68378271
Klíčová slova: nanocrystalline diamond * rough silicon
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

Efficient growth of nanocrystalline diamond (NCD) requires nucleation enhancement before chemical vapour deposition step. Nanodiamond (ND) seeding is a commonly used technique that yields high nucleation densities. This technique is well established for conventional planar substrates with low surface roughness. However, many engineering application requires NCD grow on rough and/or non-planar substrates. In this work, we investigate quality of nanodiamond seeding on silicon substrates of high surface roughness (RMS roughness <1 mm). Seeded substrates and deposited diamond films were analysed by atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman spectroscopy. We discuss influence of nanodiamond particles in seeding solution and seeding technique on nucleation density and quality of deposited NCD film.
Trvalý link: http://hdl.handle.net/11104/0237628