Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser

0432642 - FZÚ 2015 RIV GB eng J - Článek v odborném periodiku
Pira, P. - Burian, T. - Kolpaková, A. - Tichý, M. - Kudrna, P. - Daniš, S. - Juha, Libor - Lančok, Ján - Vyšín, Luděk - Civiš, Svatopluk - Zelinger, Zdeněk - Kubát, Pavel - Wild, J.
Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser.
Journal of Physics D-Applied Physics. Roč. 47, č. 40 (2014), 1-6. ISSN 0022-3727. E-ISSN 1361-6463
Grant CEP: GA ČR(CZ) GAP108/11/1312
Institucionální podpora: RVO:68378271 ; RVO:61388955
Klíčová slova: XUV laser * pulsed laser deposition * Langmuir probe * plasma plume
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 2.721, rok: 2014

Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1–3 eV and 1013–1014m-3, resp. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe’s observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.
Trvalý link: http://hdl.handle.net/11104/0237023