Short-wavelength ablation of polymers in the high-fluence regime

0431826 - FZÚ 2015 RIV SE eng J - Článek v odborném periodiku
Liberatore, Chiara - Mann, K. - Müller, M. - Pina, L. - Juha, Libor - Vyšín, Luděk - Rocca, J.J. - Endo, Akira - Mocek, Tomáš
Short-wavelength ablation of polymers in the high-fluence regime.
Physica Scripta. T161, MAY (2014), "014066-1"-"014066-4". ISSN 0031-8949. E-ISSN 1402-4896
Grant CEP: GA MŠMT ED2.1.00/01.0027; GA MŠMT EE2.3.20.0143
Grant ostatní: HILASE(XE) CZ.1.05/2.1.00/01.0027; OP VK 6(XE) CZ.1.07/2.3.00/20.0143
Institucionální podpora: RVO:68378271
Klíčová slova: extreme ultraviolet * soft x-ray * ablation * polymers
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 1.126, rok: 2014

Short-wavelength ablation of poly(1,4-phenylene ether-ether-sulfone) (PPEES) and poly(methyl methacrylate) (PMMA) was investigated using extreme ultraviolet (XUV) and soft x-ray (SXR) radiation from plasma-based sources. The initial experiment was performed with a 10 Hz desktop capillary-discharge XUV laser lasing at 46.9 nm. The XUV laser beam was focused onto the sample by a spherical mirror coated with a Si/Sc multilayer. The same materials were irradiated with 13.5 nm radiation emitted by plasmas produced by focusing an optical laser beam onto a xenon gas-puff target. A Schwarzschild focusing optics coated with a Mo/Si multilayer was installed at the source to achieve energy densities exceeding 0.1 J cm−2 in the tight focus. The existing experimental system at the Laser Laboratorium Göttingen was upgraded by implementing a 1.2 J driving laser. An increase of the SXR fluence was secured by improving the alignment technique.
Trvalý link: http://hdl.handle.net/11104/0236368