The Influence of Various Deposition Techniques on the Structural and Photoelectrochemical Properties of the thin TiO2 Films

0431187 - ÚCHP 2015 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Morozová, Magdalena - Klusoň, Petr - Dzik, P. - Veselý, M. - Baudys, M. - Krýsa, J. - Šolcová, Olga
The Influence of Various Deposition Techniques on the Structural and Photoelectrochemical Properties of the thin TiO2 Films.
Proceedings of the 6th Czech-Austrian workshop. Prague: KANAG -TISK, 2014 - (Krýsa, J.; Klusoň, P.), s. 14-15. ISBN 978-80-7080-886-3.
[Czech-Austrian Workshop: New Trends in Photo and Electro Catalysis /6./. Hnanice (CZ), 02.12.2013-04.12.2013]
Grant CEP: GA TA ČR TA01020804
Grant ostatní: GA ČR(CZ) GP104/09/P165; GA ČR(CZ) GAP108/12/2104
Program: GA
Institucionální podpora: RVO:67985858
Klíčová slova: thin films * nanostructured electrode material * TiO2 layers
Kód oboru RIV: CI - Průmyslová chemie a chemické inženýrství

In recent years thin films as the nanostructured electrode material have evoked a great interest in fields of photovoltaics, energy storage, sensing, photo-electrocatalysis etc. The aim of this thesis was the preparation of functional thin TiO2 layers by chemical way using the reverse micelles templating. The sol–gel TiO2 layers deposited on the conductive ITO glass by three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as photo-anode in the three-compartment electrochemical cell. Relationships between structural properties and photo-induced conductivity of the nanostructured layers were studied.
Trvalý link: http://hdl.handle.net/11104/0235789