Graphene. Properties, preparation, characterization and devices

0427982 - ÚFCH JH 2015 RIV GB eng M - Část monografie knihy
Frank, Otakar - Kalbáč, Martin
Chemical vapor deposition (CVD) growth of graphene films.
Graphene. Properties, preparation, characterization and devices. Cambridge: Woodhead Publishing, 2014 - (Skákalová, V.; Kaiser, A.), s. 27-49. Woodhead Publishing Series in Electronic and Optical Materials, 57. ISBN 978-0-85709-508-4
Grant CEP: GA MŠMT LL1301
Institucionální podpora: RVO:61388955
Klíčová slova: graphene * chemical vapor deposition (CVD) * isotope labeling
Kód oboru RIV: CF - Fyzikální chemie a teoretická chemie

The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.
Trvalý link: http://hdl.handle.net/11104/0233427