Diamond films deposited by oxygen-enhanced linear plasma chemistry

0425742 - FZÚ 2014 RIV US eng J - Článek v odborném periodiku
Kromka, Alexander - Babchenko, Oleg - Ižák, Tibor - Varga, Marián - Davydova, Marina - Krátká, Marie - Rezek, Bohuslav
Diamond films deposited by oxygen-enhanced linear plasma chemistry.
Advanced Science, Engineering and Medicine. Roč. 5, č. 6 (2013), s. 509-514. ISSN 2164-6627
Grant CEP: GA ČR(CZ) GBP108/12/G108; GA ČR GAP108/12/0996
Institucionální podpora: RVO:68378271
Klíčová slova: diamond films * process gas chemistry * pulsed microwave plasma * surface conductivity of diamond
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

Diamond thin film growth over large area is mandatory for their industrial uses. Linear antenna microwave CVD process is novel method for growing diamond film at low pressure ranges (below 100 Pa) and low plasma temperature over large areas. Step-by-step optimizing gas mixture (CO2 and CH4) is required for fundamental understanding of the CVD diamond growth phenomena in such novel process. We show that adding CO2 to the methane/hydrogen gas mixture increases the growth rate up to 4 times and film quality also improves, as dedicated from Raman measurements. Electronic grade diamond films are successfully grown for lower CO2 and methane content in hydrogen and fabricated solution-gated field effect transistors are fully functional.
Trvalý link: http://hdl.handle.net/11104/0231553