Deposition of hematite Fe.sub.2./sub.O.sub.3./sub. thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

0423298 - FZÚ 2014 RIV CH eng J - Článek v odborném periodiku
Hubička, Zdeněk - Kment, Štěpán - Olejníček, Jiří - Čada, Martin - Kubart, T. - Brunclíková, Michaela - Kšírová, Petra - Adámek, Petr - Remeš, Zdeněk
Deposition of hematite Fe₂O₃ thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system.
Thin Solid Films. Roč. 549, Dec (2013), s. 184-191. ISSN 0040-6090. E-ISSN 1879-2731
Grant CEP: GA ČR GAP108/12/2104; GA MŠMT LH12043
Grant ostatní: AVČR(CZ) M100101215
Institucionální podpora: RVO:68378271
Klíčová slova: HIPIMS * thin films * hollow cathode
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 1.867, rok: 2013

Semiconducting hematite Fe2O3 thin films were fabricated by means of reactive sputtering in a high power DC pulsed magnetron (HIPIMS) and in a DC pulsed hollow cathode plasma jet sputtering system. Fused silica slides (quartz) were used as substrates.
Trvalý link: http://hdl.handle.net/11104/0229416