Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases

0397579 - FZÚ 2014 RIV DE eng J - Článek v odborném periodiku
Pokorný, D. - Novotný, Michal - Musil, Jindřich - Fitl, Přemysl - Bulíř, Jiří - Lančok, Ján
Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases.
Plasma Processes and Polymers. Roč. 10, č. 7 (2013), s. 593-602. ISSN 1612-8850. E-ISSN 1612-8869
Grant CEP: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/1312; GA ČR(CZ) GAP108/11/0958
Grant ostatní: AVČR(CZ) M100101271
Institucionální podpora: RVO:68378271
Klíčová slova: double charge ions * mass spectrometry * noble gas * RF magnetron discharges * silver * single charge ions
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 2.964, rok: 2013

The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg)+, X2+, Ag2+, X++ and Ag++ were found in the RF discharges; here X=Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.
Trvalý link: http://hdl.handle.net/11104/0225197