Nanoparticles in hydrogenated silicon

0391268 - FZÚ 2014 CZ eng A - Abstrakt
Stuchlík, Jiří - Stuchlíková, The-Ha - Dřínek, Vladislav - Remeš, Zdeněk - Kočka, Jan
Nanoparticles in hydrogenated silicon.
Development of Materials Science in Research and Education, Book of Abstracts of the 22nd Joint Seminar. Praha: Czechoslovak Association for Crystal Growth (CSACG), 2012 - (Kožíšek, Z.; Nitsch, K.). s. 65-65. ISBN 978-80-260-2357-9.
[Joint Seminar – Development of materials science in research and education /22./. 03.09.2012-07.09.2012, Lednice]
Grant CEP: GA ČR GA203/09/1088; GA MŠMT LC510; GA MŠMT LH12236
Výzkumný záměr: CEZ:AV0Z10100521
Institucionální podpora: RVO:67985858
Klíčová slova: silicon thin films * solar cells
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

We developed the radio frequency plasma enhanced chemical vapor deposition (RF PE CVD) of hydrogenated silicon thin film in glow discharge of Silane diluted in Hydrogen. In the last years we have started to investigate the properties of nanoparticles embedded in the silicon matrix. We have observed that some nanoparticles can indeed be embedded in the silicon to create the quantum dots, whereas others lead to catalytic growth of silicon nanowires (Si-NW).
Trvalý link: http://hdl.handle.net/11104/0220369