E-beam pattern generator BS600 and technology zoom

0390983 - ÚPT 2013 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Kolařík, Vladimír - Horáček, Miroslav - Matějka, František - Matějka, Milan - Urbánek, Michal - Krátký, Stanislav - Král, Stanislav - Bok, Jan
E-beam pattern generator BS600 and technology zoom.
NANOCON 2012, 4th International Conference Proceedings. Ostrava: TANGER Ltd, 2012, s. 822-825. ISBN 978-80-87294-32-1.
[NANOCON 2012. International Conference /4./. Brno (CZ), 23.10.2012-25.10.2012]
Grant CEP: GA MŠMT ED0017/01/01; GA MPO FR-TI1/576
Institucionální podpora: RVO:68081731
Klíčová slova: E-beam pattern generator * E-beam lithography * reduced size shaped beam
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika

This contribution deals with an electron beam pattern generator (ELG) working with a rectangular shape variable size electron beam originally developed at Institute of Scientific Instruments (ISI), later on commercialized as a BS600 series by former company Tesla, and recently upgraded by ISI cooperating with several partners. The key issue of this paper is a recently developed exposure mode which is called Technology Zoom (TZ mode) since its original concept until the recent progress. This ELG operating in the TZ mode provides three main advantages when compared to the standard exposure mode: higher exposure speed due to increased beam current density; finer stamp size adjustment and sharper stamp shape due to the stronger size reduction of the shaping aperture. Further, we discussed also some drawbacks and practical issues of the TZ mode. And finally, we summarize some results on real exposure examples. The new exposure mode (together with other recent upgrades) makes the BS600 pattern generator very useful for the nanotechnology patterning tasks and challenges.
Trvalý link: http://hdl.handle.net/11104/0219948