Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures

0390982 - ÚPT 2013 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Matějka, Milan - Urbánek, M. - Kolařík, V. - Horáček, M. - Krátký, Stanislav - Mikšík, P. - Vašina, J.
Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures.
NANOCON 2012, 4th International Conference Proceedings. Ostrava: TANGER Ltd, 2012, s. 729-732. ISBN 978-80-87294-32-1.
[NANOCON 2012. International Conference /4./. Brno (CZ), 23.10.2012-25.10.2012]
Grant CEP: GA MPO FR-TI1/576; GA MŠMT ED0017/01/01; GA TA ČR TE01020233
Institucionální podpora: RVO:68081731
Klíčová slova: 3D resist structures * variable shape electron beam lithography * proximity effect simulation and correction * polymer resist * development process simulation
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika

A proximity effect simulation technique and developed resist profile simulation for variable-shaped e-beam lithography of three dimensional structures are presented. The e-beam lithography is a technology process which allows high resolution patterning. Most frequently it is used for microfabrication or nanofabrication of two dimensional relief structures such as resist photo masks, etching masks, diffraction gratings, micro and nano optics, photonics and more. However, in the case of the 3D structures patterning the precise thickness control of developed resist is required. With regard to subsequent proximity effect correction, the proximity effect simulation and developed resist profile simulation models are in the case of 3D structures fabrication critically important. We show the results from simulation of exposure and resist development process for the chosen polymer resist (PMMA), using the patterning and simulation e-beam lithography software.
Trvalý link: http://hdl.handle.net/11104/0219947