In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film

0390588 - FZÚ 2013 RIV CN eng A - Abstrakt
Novotný, Michal - Bulíř, Jiří - Lančok, Ján - Pokorný, P. - Piksová, K. - Fekete, Ladislav - Musil, Jindřich - Čekada, M.
In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film.
The 8th Asian - European International Conference on Plasma Surface Engineering. AEPSE 2011. Dalian: AJC PSE, EJC PISE, 2011 - (Lei, M.). 216 O-101
[AEPSE 2011. The 8th Asian - European International Conference on Plasma Surface Engineering. 19.09.2011-22.09.2011, Dalian]
Grant CEP: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/0958; GA MŠMT(CZ) MEB091125; GA ČR GP202/09/P324
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: silver * magnetron sputtering * in-situ monitoring * plasma characterization
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

Ultrathin nanostructured silver films exhibit unusual properties and performances. Functional properties of the film depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions, which are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions promoting the growth of nanostructured film can be established via varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions.
Trvalý link: http://hdl.handle.net/11104/0219453