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Structuring of diamond films by reactive ion plasma etching

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    0389420 - FZÚ 2013 RIV CZ eng K - Konferenční příspěvek (tuzemská konf.)
    Domonkos, M. - Ižák, Tibor - Proška, J. - Kromka, Alexander
    Structuring of diamond films by reactive ion plasma etching.
    Nanomateriály a nanotechnologie ve stavebnictví 2012 (NaNS 2012). Praha: ČVUT, 2012 - (Rácová, Z.; Tesárek, P.; Nežerka, V.; Ryparová, P.), s. 35-40. ISBN 978-80-01-05132-0.
    [Nanomateriály a nanotechnologie ve stavebnictví 2012 (NaNS 2012). Praha (CZ), 11.09.2012-11.09.2012]
    Grant CEP: GA ČR GAP108/12/0910; GA ČR(CZ) GAP108/11/0794; GA AV ČR(CZ) IAAX00100902
    Výzkumný záměr: CEZ:AV0Z10100521
    Klíčová slova: nanostructuring * diamond thin films * reactive ion etching * scanning electron microscopy
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

    In this study, two common strategies of diamond film structuring are described. Main focus is on the comparison of top-down and the bottom-up strategies. The top-down strategy is primary related to dry reactive ion etching through masking materials (or even without mask), while bottom-up strategy is based on selective area deposition of diamond film. Several methods of both strategies are demonstrated in details in the article, regarding to their properties and basic principles.
    Trvalý link: http://hdl.handle.net/11104/0218280

     
     
Počet záznamů: 1