Photolithographic technique for controlled fabrication of metal structures

0386193 - ÚIACH 2013 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Jusková, Petra - Hegrová, Jitka - Foret, František
Photolithographic technique for controlled fabrication of metal structures.
CECE 2012. 9th International Interdisciplinary Meeting on Bioanalysis. Brno: Ústav analytické chemie AV ČR, v. v. i, 2012 - (Foret, F.; Křenková, J.; Guttman, A.; Klepárník, K.; Boček, P.), s. 199-202. ISBN 978-80-904959-1-3.
[CECE 2012. International Interdisciplinary Meeting on Bioanalysis /9./. Brno (CZ), 01.11.2012-02.11.2012]
Grant CEP: GA ČR(CZ) GAP301/11/2055; GA ČR(CZ) GBP206/12/G014
Institucionální podpora: RVO:68081715
Klíčová slova: metal microstructures * microfabrication * photolithography
Kód oboru RIV: CB - Analytická chemie, separace

We are describing two strategies for controlled (geometry and dimension) preparation of metal micro-nano structures. Both techniques are based on photolithographic processes with selective pattern transfer. First technique utilizes agarose gel containing photosensitive silver chloride as the photosensitive layer. Silver structures are formed after irradiation of the gel through the photolithographic mask which defines shape of the resulting structures. Second approach utilizes photolithographic process to form particles from vacuum deposited thin metal layer deposited over soluble sacrificial layer.
Trvalý link: http://hdl.handle.net/11104/0215413