PLD and RF discharge combination used for preparation of photocatalytic TiO.sub.2./sub. layers

0382104 - FZÚ 2013 RIV NL eng J - Článek v odborném periodiku
Remsa, J. - Mikšovský, Jan - Jelínek, Miroslav
PLD and RF discharge combination used for preparation of photocatalytic TiO₂ layers.
Applied Surface Science. Roč. 258, č. 23 (2012), s. 9333-9336. ISSN 0169-4332. E-ISSN 1873-5584
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: pulsed laser deposition * titanium dioxide, * photocatalysis, * RF discharge * thin films
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 2.112, rok: 2012
http://dx.doi.org/10.1016/j.apsusc.2012.02.042

Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm−2 to 9 J cm−2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers’ crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties.
Trvalý link: http://hdl.handle.net/11104/0007182