SPM Nanoscratching in the Sub 100 nm Resolution

0375380 - ÚPT 2012 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Urbánek, Michal - Kolařík, Vladimír - Matějka, Milan
SPM Nanoscratching in the Sub 100 nm Resolution.
NANOCON 2011. 3rd International Conference. Ostrava: Tanger spol. s r. o, 2011, s. 213-217. ISBN 978-80-87294-27-7.
[NANOCON 2011. International Conference /3./. Brno (CZ), 21.09.2011-23.09.2011]
Grant CEP: GA MPO FR-TI1/576; GA MŠMT ED0017/01/01
Výzkumný záměr: CEZ:AV0Z20650511
Klíčová slova: SPM microscopy * nanoscratching
Kód oboru RIV: JP - Průmyslové procesy a zpracování

Scanning probe microscopy (SPM) is tool basically used for surface characterization. Besides that, it offers several lithographic methods (e.g. nanoscratching) to prepare structures in the sub 100 nm resolution. The nanoscratching using SPM offers a method for patterning of surface with a very high resolution based on near field interaction. By this method some tiny marks or taggants could be prepared. Therefore we used the SPM nanoscratching for preparation of nanostructures in thin soft polymer films by various tips. Nanoscratching regime of SPM is possible to operate in contact and close contact modes. In the contact mode we prepared an array of stamps with a variable size, where dimensions and depth dependency on number of pixels were inspected. For writing of these structures we used polymer films with different softness (e.g. PMMA, SU-8) and various values of setpoint, which are responsible for structures deepness.
Trvalý link: http://hdl.handle.net/11104/0208051