Fluorescence and optical properties of Er.sup.3+./sup. doped LaF.sub.3./sub. films fabricated by Electron Beam Evaporation and Pulsed Laser Deposition

0364295 - FZÚ 2012 FR eng A - Abstrakt
Lančok, Ján - Novotný, Michal - Bulíř, Jiří - Fitl, Přemysl - Pokorný, Petr - Bočan, Jiří - Munoz, D. - Gonzalo, J. - Afonso, C.N. - Moine, B.
Fluorescence and optical properties of Er³⁺ doped LaF₃ films fabricated by Electron Beam Evaporation and Pulsed Laser Deposition.
E-MRS - Strasbourg - 2010 K: Rare earth doped materials for optical based technologies. Strasbourg: EMRS, 2010. 3 16/1.
[E-MRS - Strasbourg - 2010 K: Rare earth doped materials for optical based technologies. 07.06.2010-11.06.2010, Strasbourg]
Grant CEP: GA AV ČR IAA100100729
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: Electron Beam Evaporation * Fluoride LaF₃ * fluorescence
Kód oboru RIV: BH - Optika, masery a lasery

Er3+doped LaF3 thin films were fabricated on fused silica, Si(100) and MgF2(100) substrates by combination of the Electron Beam Evaporation (EBE) and Pulsed Laser Deposition (PLD) methods. These structures are prepared in novel advanced vacuum deposition system built in the Institute of Physics AS CR. Fluoride LaF3 films were deposited via EBE using a 2kW Mini E-beam evaporator (Tectra). PLD technique, performed by a Nd:YAG laser operated at wavelength of 266 nm, was used for the doping of fluoride films by Er ions. The doping by Er was performed by three different ways: evaporation by electron EBE from ErF3:LaF3 powder mixture, by laser ablation either pressed ErF3 powder target or metallic Er target during EBE evaporation of pure LaF3 film. The films deposited at substrate temperature 200 °C were polycrystalline. The samples were characterized by spectroscopic ellipsometry in VUV, UV and visible spectral range, spectrophotometric and fluorescence measurements.
Trvalý link: http://hdl.handle.net/11104/0199816