Plasma characterization of RF magnetron sputtering of silver in Ne, Ar, Kr and Xe discharges

0359689 - FZÚ 2012 DE eng A - Abstrakt
Novotný, Michal - Bulíř, Jiří - Pokorný, Petr - Lančok, Ján
Plasma characterization of RF magnetron sputtering of silver in Ne, Ar, Kr and Xe discharges.
Twelfth International Conference on Plasma Surface Engineering. Dresden: Europäische Forschungsgesellschaft Dünne Schichten e.V. (EFDS), 2010. s. 508. ISBN N.
[International Conference on Plasma Surface Engineering /12./. 13.09.2010-17.09.2010, Garmisch-Partenkirchen]
Grant CEP: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324
Grant ostatní: VAKUUM PRAHA(CZ) VAKUUM PRAHA (2010)
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: magnetron sputtering * silver * plasma spectroscopy * optical emission spectroscopy * mass spectroscopy
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

Plasma parameters and processes play an important role in magnetron sputtering. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions favouring the growth of nanostructured film can be achieved and controlled varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions. Characterization of plasma is necessary for better understanding and controlling of the growth of the nanostructured film. We have carried out a systematic study of the influence of Ne, Ar, Kr and Xe sputtering gases on plasma properties of RF magnetron sputtering of silver. The magnetron plasma was characterized by time and spatial resolved optical emission spectroscopy(OES) and mass spectrometry. Optical emission spectra were taken in the wavelength region from 300 to 900 nm.
Trvalý link: http://hdl.handle.net/11104/0197427