Direct growth of sub-micron diamond structures

0359632 - FZÚ 2012 CZ eng A - Abstrakt
Babchenko, Oleg - Verveniotis, Elisseos - Hruška, Karel - Ledinský, Martin - Kromka, Alexander - Rezek, Bohuslav
Direct growth of sub-micron diamond structures.
13th Joint Vacuum Conference - Programme and book of abstract. Brno: Tribun EU s.r.o., 2010 - (Vesely, M.; Vincze, A.; Vavra, I.). s. 139. ISBN 978-80-7399-969-8.
[Joint Vacuum Conference /13./. 20.06.2010-24.06.2010, Strbske Pleso]
Grant CEP: GA AV ČR KAN400100701; GA AV ČR(CZ) IAAX00100902; GA MŠMT LC510; GA AV ČR(CZ) KAN400480701
Výzkumný záměr: CEZ:AV0Z10100521
Klíčová slova: selected area deposition * lithography * diamond
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

Pre-treating the diamond seeds layer in buffer oxide etchant after employing optical and electron beam lithography was applied for selected area deposition of diamond structures. By chemical vapor deposition electrically active diamond micro- and nano-channels were fabricated. Advantages and limitations of employed strategy were discussed.
Trvalý link: http://hdl.handle.net/11104/0197382