Our first step to direct writing XUV lithography(SPPT 24th.,2010)

0352880 - ÚFP 2011 RIV CZ eng O - Ostatní výsledky
Koláček, Karel - Štraus, Jaroslav - Schmidt, Jiří - Frolov, Oleksandr - Prukner, Václav - Sobota, Jaroslav - Fořt, Tomáš - Shukurov, A.
Our first step to direct writing XUV lithography(SPPT 24th.,2010).
2010
Grant CEP: GA MŠMT LA08024; GA MŠMT(CZ) LC528; GA AV ČR KAN300100702
Výzkumný záměr: CEZ:AV0Z20430508; CEZ:AV0Z20650511
Klíčová slova: nanopatterning by Ar8+ laser * laser induced periodic surface structure * ablation of 2D diffraction pattern
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech

Předneseno na konf.:24th Symposium on Plasma Physics and Technology,Prague,14-17.06.2010, : A "direct (i.e. ablation) patterning" of PMMA by pulse Ar8+ ion laser ( = 46,9 nm) was demonstrated. For focusing a long-focal spherical mirror (R = 2100 mm) covered by 14 double-layer Sc-Si coating was used. On the bottom of ablated crater a laser-induced periodic surface structure (LIPSS) with period ~2,8 m and depth 5-10 nm was revealed. Through much smaller quadratic hole (7,5x7,5 m) in mask standing in contact with PMMA the 2D diffraction pattern with period down to ~125 nm and depth ~200 nm was ablated by a 5-shot-exposition.
Trvalý link: http://hdl.handle.net/11104/0192274