Study of silver grown by magnetron sputtering in reactive gas and plasma characterization of the sputtering process

0351841 - FZÚ 2011 DE eng A - Abstrakt
Bulíř, Jiří - Novotný, Michal - Lančok, Ján - Pokorný, Petr - Bodnár, Michal
Study of silver grown by magnetron sputtering in reactive gas and plasma characterization of the sputtering process.
Twelfth International Conference on Plasma Surface Engineering. Dresden: Europäische Forschungsgesellschaft Dünne Schichten e.V. (EFDS), 2010. s. 185. ISBN N.
[International Conference on Plasma Surface Engineering /12./. 13.09.2010-17.09.2010, Garmisch-Partenkirchen]
Grant CEP: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: silver * magnetron sputtering * mass spectroscopy * optical emission spectroscopy
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

Silver is one of the most suitable materials for a fabrication of metal-dielectric and plasmonic optical devices due to its unique optical constants. The final performance of such devices significantly depends on a quality of the silver structure, which is mainly influenced during the initial nucleation of the silver on the substrate. Moreover, the nucleation process is significantly influenced by presence of the reactive gas and the plasma parameters. Therefore we focused our attention on a systematic study of the plasma parameters and its correlation to the mode of the silver nucleation at different sputtering conditions. The silver layers were deposited by RF magnetron sputtering in a mixture of Ar and reactive gas (O2, N2). The initial stage of the nucleation and the layer growth was studied by means of the optical monitoring, which is based on a principle of spectrophotometric measurement of the sample reflectivity. The measured data were fitted to a mathematical model.
Trvalý link: http://hdl.handle.net/11104/0191497