Multistage ion implantation of polyamide-6 films

0185052 - UJF-V 20000222 RIV NL eng J - Článek v odborném periodiku
Popok, V. N. - Odzhaev, V. B. - Azarko, I. I. - Kozlov, I. P. - Sviridov, D. V. - Hnatowicz, Vladimír - Vacík, Jiří - Červená, Jarmila
Multistage ion implantation of polyamide-6 films.
Nuclear Instruments & Methods in Physics Research Section B. 166/167, - (2000), s. 660-663. ISSN 0168-583X. E-ISSN 1872-9584
Grant CEP: GA ČR GA203/99/1626; GA AV ČR KSK1010601
Kód oboru RIV: BG - Jaderná, atomová a mol. fyzika, urychlovače
Impakt faktor: 0.955, rok: 2000

The radiation defect formation accompanied by the paramagnetic centre creation by multistage boron ion implantation into polyamide-6 (PA) films was studied using the ESR technique. It was found that the multistage implantation with the energy increasing from step to step results in the rearrangement of the polymer layer being accompanied with the compensation of the terminated carbon bonds and strong exchange interaction between pí-electrons. By contrast, a decrease of the ion energy from one implantation step to another one leads to the progressive accumulation of the paramagnetic centres in the implanted layers that permits to create highly conductive channels from the surface to the buried conducting carbonaceous layer produced in the polymer film via ion bombardment and to fabricate planar field-effect electronic devices based on ion-implanted polymers.
Trvalý link: http://hdl.handle.net/11104/0081474