Semiconductor Nanoparticles in the Channels of Mesoporous Silica and Titania Thin Films

0181633 - UFCH-W 20030054 RIV NL eng C - Konferenční příspěvek (zahraniční konf.)
Wark, M. - Wellman, H. - Rathouský, Jiří - Zukal, Arnošt
Semiconductor Nanoparticles in the Channels of Mesoporous Silica and Titania Thin Films.
Impact of Zeolites and Other Porous Materials on the New Technologies at the Beginning of the New Millennium. Amsterdam: Elsevier, 2002 - (Aiello, R.; Giordano, G.; Testa, F.), s. 1457-1464. Studies in Surface Science and Catalysis., 142.
[International of FEZA /2./. Taormina (IT), 01.09.2002-05.09.2002]
Grant CEP: GA AV ČR IAA4040804
Výzkumný záměr: CEZ:AV0Z4040901
Klíčová slova: semiconductor nanoparticles * mesoporous silica * thin films
Kód oboru RIV: CF - Fyzikální chemie a teoretická chemie

A procedure for the preparation of porous silica thin films was developed, which is based on the use of block copolymers as structure directing agents and the application of the dip-coating technique. The prepared films exhibit an uniform thickness and a large roughness factor indicating the highly developed porosity. The addition of Cd2+ ions to the reaction gel for silica films prior to their formation, followed by the calcination of films at 623 K and treatment with H2S or H2Se is the preferred procedure for the creation of CdS or CdSe nanoparticles. The occurrence of the size-quantization effect confirms that the particles are located within the pores and that their size corresponds to the pore width of the host. The porous structure of titania films prepared using a poly(alkylene) block copolymer in an ethanolic medium depends on their thickness because the completeness of the hydrolysis of the titania precursor is decided by its accessibility for air humidity.
Trvalý link: http://hdl.handle.net/11104/0078169