Počet záznamů: 1
Megawatt Laser Photolysis of Trimethyl(vinyloxy)silane: Formation of Nano-sized Cross-linked Polyoxocarbosilane with Superior Thermal Stability
- 1.0166827 - UCHP-M 20030144 RIV NL eng J - Článek v odborném periodiku
Pola, Josef - Tomovska, R. - Bakardjieva, Snejana - Galíková, Anna - Vacek, Karel - Galík, Aftanas
Megawatt Laser Photolysis of Trimethyl(vinyloxy)silane: Formation of Nano-sized Cross-linked Polyoxocarbosilane with Superior Thermal Stability.
Journal of Non-Crystalline Solids. Roč. 328, 1-3 (2003), s. 227-236. ISSN 0022-3093. E-ISSN 1873-4812
Grant CEP: GA MŠMT OC 523.60
Výzkumný záměr: CEZ:AV0Z4032918; CEZ:AV0Z4072921
Klíčová slova: polyoxocarbosilane * laser chemical vapour deposition * trimethyl(vinyloxy)silane
Kód oboru RIV: CF - Fyzikální chemie a teoretická chemie
Impakt faktor: 1.563, rok: 2003
Megawatt ArF laser induced photolysis of gaseous trimethyl(vinyloxy)silane (TMVSi) results in chemical vapour deposition of solid nano-sized polyoxocarbosilane that is deduced as formed via agglomerization of SiCHnO species (nú3). The laser fabricated polymer shows superior thermal stability, contains radical Si centers and is described as a crosslinked polymethyloxocarbosilane consisting of CnSiO4-n (n = 0-3) configurations.
Trvalý link: http://hdl.handle.net/11104/0063936
Počet záznamů: 1