IR Laser-Induced Thermolysis of (Chloromethyl)silane: Complex Reaction Involving H2Si:, H2C: and HClSi: Transients and Yielding Nanostructured Si/C/H Phases

0166536 - UCHP-M 20020225 RIV GB eng J - Článek v odborném periodiku
Pola, Josef - Santos, M. - Diaz, L. - Jursíková, Kristýna - Bastl, Zdeněk - Boháček, Jaroslav - Fajgar, Radek - Urbanová, Markéta
IR Laser-Induced Thermolysis of (Chloromethyl)silane: Complex Reaction Involving H2Si:, H2C: and HClSi: Transients and Yielding Nanostructured Si/C/H Phases.
Journal of Materials Chemistry. Roč. 12, č. 5 (2002), s. 1519-1524. ISSN 0959-9428
Grant CEP: GA ČR GA104/00/1294
Klíčová slova: chemical-vapor-deposition * powered homogeneous pyrolysis * induced decomposition
Kód oboru RIV: CH - Jaderná a kvantová chemie, fotochemie
Impakt faktor: 2.683, rok: 2002

Multi-pulse and single-pulse infrared laser induced thermolysis of gaseous (chloromethyl) silane, H3SiCH2Cl occurs via 1,1-HCl and H2C: elimination and dehydrogenation and yields nano-structured Si/C/H phases containing most of the Si and C atoms of the precursor. The identification of final volatile products and observation of H2Si:, H2C: and HClSi: transients by LIF spectroscopy suggest that intermediate silene isomers decompose into silylene and carbene. The deposited films are composed of SiC and polycarbosilane and their H content differs depending on the mode of the IR thermolysis.
Trvalý link: http://hdl.handle.net/11104/0001378