IR Laser-Induced Thermolysis of Silacyclopent-3-ene: Extru sion of Silylene and Chemical Vapour Deposition of Polycarb osilane Phases Via Reactions of Silylene, Buta-1,3-Diene a nd Methylene

0165932 - UCHP-M 20000149 RIV US eng J - Článek v odborném periodiku
Pola, Josef - Urbanová, Markéta - Díaz, L. - Santos, M. - Bastl, Zdeněk - Šubrt, Jan
IR Laser-Induced Thermolysis of Silacyclopent-3-ene: Extru sion of Silylene and Chemical Vapour Deposition of Polycarb osilane Phases Via Reactions of Silylene, Buta-1,3-Diene a nd Methylene.
Journal of Organometallic Chemistry. Roč. 605, - (2000), s. 202-208. ISSN 0022-328X. E-ISSN 1872-8561
Grant CEP: GA ČR GA104/00/1294
Grant ostatní: DGES(ES) PB96-0844-C02-02
Kód oboru RIV: CH - Jaderná a kvantová chemie, fotochemie
Impakt faktor: 1.632, rok: 2000

Infrared laser-induced (SF6) photosensitized decomposition and infrared laser multiphoton decomposition of silacyclopent-3-ene occur as extrusion of silylene, yielding butadiene as a major gaseous product and affording chemical vapour deposition of so lid saturated polycarbosilane films. The involvement of H2Si: H2C: and buta-1,3-diene in the formation of the films is revealed through quantification of the gaseous products and identification of H2Si: and H2C: by laser induced fluorescence.
Trvalý link: http://hdl.handle.net/11104/0063084