Measurements of escape probability of photoelectrons and the inelastic mean free path in silver sulphide

0134643 - FZU-D 20030543 RIV GB eng J - Článek v odborném periodiku
Zemek, Josef - Jiříček, Petr - Hucek, Stanislav - Lesiak, B. - Jablonski, A.
Measurements of escape probability of photoelectrons and the inelastic mean free path in silver sulphide.
Surface and Interface Analysis. Roč. 30, - (2000), s. 222-227. ISSN 0142-2421. E-ISSN 1096-9918
Grant ostatní: GAUK(CZ) 1051-10/733
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: escape probability * IMFP * Ag₂S
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.215, rok: 2000

The escape probability as a function of depth of origin for the S 2s photoelectrons exhibits non-monotonic beahviour, with a maximum at a depth of 0.6-0.8 nm.
Trvalý link: http://hdl.handle.net/11104/0032538