Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films

0134425 - FZU-D 20030325 RIV NL eng J - Článek v odborném periodiku
Čada, Martin - Hubička, Zdeněk - Adámek, P. - Ptáček, Pavel - Šíchová, Hana - Šícha, Miloš - Jastrabík, Lubomír
Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films.
Surface and Coatings Technology. 174-175, - (2003), s. 627-631. ISSN 0257-8972
Grant CEP: GA ČR GP202/02/P021; GA ČR GA202/00/1592; GA MŠMT LN00A015; GA MŠMT ME 441
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: plasma jet * ZnO thin films * Langmuir probe
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.410, rok: 2003

RF and DC plasma jet sputtering systems were investigated as sources for deposition of ZnO thin films. Deposited zone films have a strong orientation of hexagonal crystallites with "c" axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150 o C during the deposition. Langmuir probe measurement performed at the substrate revealed two groups of electrons with different temperatures in the DC plasma jet.
Trvalý link: http://hdl.handle.net/11104/0032328