Elastic electron backscattering from silicon surfaces: effect of surface roughness

0133882 - FZU-D 20020165 RIV GB eng J - Článek v odborném periodiku
Zemek, Josef - Jiříček, Petr - Jablonski, A. - Lesiak, B.
Elastic electron backscattering from silicon surfaces: effect of surface roughness.
Surface and Interface Analysis. Roč. 34, - (2002), s. 215-219. ISSN 0142-2421. E-ISSN 1096-9918
Grant ostatní: KBN(PL) Project 15/30
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: electron elastic backscattering intensity * elastic peak electron spectroscopy * EPES
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.071, rok: 2002

In the present work, systematic study has been carried out on the influence of surface roughness on the electron IMFPs determined by the EPES method using a Cu standard.
Trvalý link: http://hdl.handle.net/11104/0031832