0133641 - FZU-D 20010441 RIV NL eng J - Článek v odborném periodiku
Šícha, Miloš - Hubička, Zdeněk - Soukup, Ladislav - Jastrabík, Lubomír - Čada, Martin - Špatenka, P.
Low-pressure RF multi-plasma-jet system for deposition of alloy and composite films.
Surface and Coatings Technology. Roč. 148, - (2001), s. 199-205. ISSN 0257-8972. E-ISSN 1879-3347
Grant CEP: GA ČR GA202/00/1592; GA MŠMT LN00A015
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: plasma jet * composite thin-films * sputtering * emission
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.236, rok: 2001

A plasma-chemical reactor with a multi-plasma-jet RF holow-cathode system has been developed for the deposition of alloy and composite thin films. Two primary plasma-jet channels and one secondary plasma channel were created in the volume of the reactor.
Trvalý link: http://hdl.handle.net/11104/0031604