0132086 - FZU-D 980340 RIV US eng J - Článek v odborném periodiku
Benda, M. - Vlček, J. - Cibulka, V. - Musil, Jindřich
Plasma nitriding combined with a hollow cathode discharge sputtering at high pressure.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 15, č. 5 (1997), s. 2636-2643. ISSN 0734-2101. E-ISSN 1520-8559
Grant CEP: GA ČR GV106/96/K245
Impakt faktor: 1.576, rok: 1997
Trvalý link: http://hdl.handle.net/11104/0030124