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Thermodynamics of HCl and HF Interferences in Hot Producer Gas Desulfurization by Zinc, Cerium and Lanthanum Oxide Based Sorbents
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SYSNO ASEP 0446236 Document Type C - Proceedings Paper (int. conf.) R&D Document Type The record was not marked in the RIV Title Thermodynamics of HCl and HF Interferences in Hot Producer Gas Desulfurization by Zinc, Cerium and Lanthanum Oxide Based Sorbents Author(s) Svoboda, Karel (UCHP-M) RID, ORCID, SAI
Hartman, Miloslav (UCHP-M) RID, ORCID, SAI
Havlica, Jaromír (UCHP-M) RID, ORCID, SAI
Leitner, J. (CZ)
Pohořelý, Michael (UCHP-M) RID, ORCID, SAI
Šyc, Michal (UCHP-M) RID, SAI, ORCID
Chen, P.-Ch. (TW)Source Title Abstracts-book. - - : -, 2015 / ScienceKNOW Conferences C.B. - ISBN 978-84-944311-1-1 Pages s. 202 Number of pages 1 s. Publication form Online - E Action International Conference on Chemical and Biochemical Engineering Event date 20.07.2015-22.07.2015 VEvent location Paris-Saint Denis Country FR - France Event type WRD Language eng - English Country FR - France Keywords gas cleaning ; thermodynamics ; Ce2O3, La2O3 sorbent Subject RIV CI - Industrial Chemistry, Chemical Engineering Institutional support UCHP-M - RVO:67985858 Annotation The thermodynamic analyses are focused on the determination of theoretical equilibrium concentrations of HCl and HF for ZnO, La2O3, and CexOy-based sulfur compounds sorbents and on the interferences of hydrogen halides in H2S removal in the temperature range 600 – 1000 K. The ZnO, La2O3 and Ce2O3-based sorbents are comparable in equilibrium H2S concentrations. The lowest H2S concentration, even below 0.1 ppm-v can be attained by Ce2O3-based sorbents (formation of Ce2O2S). The prevention of oxidation of the Ce2O3-based sorbents to less efficient CeO2 is important. Our results confirm that the ZnO-based sorbents are relatively insensitive to the presence of HCl and HF in producer gas (up to hundreds of ppm-v). The La2O3-based sorbents of sulfur compounds are sensitive to HCl and HF concentrations in gas. Ce2O3-based sorbents are less affected by presence of HCl. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2016
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