Understanding pulsed laser deposition process of copper halides via plasma diagnostics techniques

0560691 - FZÚ 2023 RIV US eng J - Journal Article
Irimiciuc, Stefan - Chertopalov, Sergii - Novotný, Michal - Craciun, V. - Lančok, Ján
Understanding pulsed laser deposition process of copper halides via plasma diagnostics techniques.
Journal of Applied Physics. Roč. 130, č. 24 (2021), č. článku 243302. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA20-21069S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : Langmuir probe * iodide thin-films * ambient gas
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 2.877, year: 2021
Method of publishing: Limited access
https://doi.org/10.1063/5.0077082

Due to the raised interest in copper halides for optoelectronic applications, a wide range of plasma diagnostic tools based on Langmuir probe (LP) and optical emission spectroscopy (OES) were implemented to investigate the pulsed laser deposition (PLD) process of selected copper halides. This represents the first report of complete diagnostics of copper halide plasma generated by laser ablation. High plasma potential and electron temperature were observed by a time-resolved LP analysis, which affected the kinetic energy of the ejected ions during expansion. The effect of argon gas addition on the copper halide plasma dynamics was investigated. Angle-resolved measurements revealed a narrow cone plasma expansion with a dual peak charge particle distribution, which was affected only above 2 Pa of Ar atmosphere.
Permanent Link: https://hdl.handle.net/11104/0333550