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The Effect of Process Conditions and Post-deposition Annealing on the Residual Stress in Carbon Nitride Films Prepared by Magnetron Sputtering
- 1.0352946 - ÚPT 2011 BE eng A - Abstract
Mikmeková, Eliška - Sobota, Jaroslav - Fořt, Tomáš - Caha, O.
The Effect of Process Conditions and Post-deposition Annealing on the Residual Stress in Carbon Nitride Films Prepared by Magnetron Sputtering.
Ninth International Symposium on Reactive Sputter Deposition. Ghent: Ghent University, 2010. P-16.
[International Symposium on Reactive Sputter Deposition /9./. 09.12.2010-10.12.2010, Ghent]
Institutional research plan: CEZ:AV0Z20650511
Keywords : residual stress * carbon nitride films * magnetron sputtering
Subject RIV: JI - Composite Materials
The aim of this work is to find a method of residual stress regulation in thin carbon nitride films and to study the influence of stress to quality of these coatings.
Permanent Link: http://hdl.handle.net/11104/0192320
Number of the records: 1