Počet záznamů: 1

Specific features of depth distribution profiles of implanted cobalt ions in rutile TiO(2)

  1. 1.
    0365920 - UJF-V 2012 RIV RU eng J - Článek v odborném periodiku
    Achkeev, A. A. - Khaibullin, R. I. - Tagirov, L.R. - Macková, Anna - Hnatowicz, Vladimír - Cherkashin, N.
    Specific features of depth distribution profiles of implanted cobalt ions in rutile TiO(2).
    Physics of the Solid State. Roč. 53, č. 3 (2011), s. 543-553 ISSN 1063-7834
    Grant CEP: GA ČR GA106/09/0125
    Výzkumný záměr: CEZ:AV0Z10480505
    Klíčová slova: ROOM-TEMPERATURE FERROMAGNETISM * SEMICONDUCTORS * OXIDE
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
    Impakt faktor: 0.711, rok: 2011

    This paper reports on the results of the calculation of the depth distribution profiles of the concentration of the impurity implanted into an anisotropic crystalline material. The sputtering of the irradiated material, fast one-dimensional diffusion of the impurity along structural channels, and accumulation of the implanted impurity at different depths have been taken into account. The results of the calculations have been compared with the experimental distribution profiles of cobalt ions implanted into the crystal structure of rutile TiO(2) along and across structural channels at different temperatures of the irradiated substrate.
    Trvalý link: http://hdl.handle.net/11104/0006615