Počet záznamů: 1
Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs
0359582 - FZU-D 2012 RIV DE eng J - Článek v odborném periodiku
Straňák, V. - Drache, S. - Čada, Martin - Hubička, Zdeněk - Tichý, M. - Hippler, R.
Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs.
Contributions to Plasma Physics. Roč. 51, 2-3 (2011), s. 237-245 ISSN 0863-1042
Grant CEP: GA AV ČR KAN301370701; GA ČR GP202/09/P159; GA AV ČR KJB100100805; GA MŠk(CZ) 1M06002; GA ČR GA202/09/0800
Grant ostatní: AVČR(CZ) M100100915
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: time-resolved plasma diagnostics * optical emission spectroscopy * Langmuir probe * magnetron sputtering
Kód oboru RIV: BH - Optika, masery a lasery
Impakt faktor: 1.108, rok: 2011
Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 μs and 500 μs between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz and duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters.
Trvalý link: http://hdl.handle.net/11104/0197343