Počet záznamů: 1

Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system

  1. 1.
    0358552 - FZU-D 2012 RIV GB eng J - Článek v odborném periodiku
    Virostko, Petr - Hubička, Zdeněk - Čada, Martin - Tichý, M.
    Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system.
    Journal of Physics D-Applied Physics. Roč. 43, č. 12 (2010), s. 1-7 ISSN 0022-3727
    Grant CEP: GA AV ČR KAN301370701; GA ČR GP202/09/P159; GA ČR GA202/09/0800
    Grant ostatní:AVČR(CZ) M100100915
    Výzkumný záměr: CEZ:AV0Z10100522
    Klíčová slova: plasma * pulsed DC * ion flux * hollow cathode
    Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
    Impakt faktor: 2.105, rok: 2010
    http://stacks.iop.org/JPhysD/43/124019

    A current of positive ions to a substrate was studied in the pulsed dc hollow cathode plasma jet system for deposition of thin films working at low pressures. The time evolution of the ion current density to the probe ji was determined for the whole period of modulation of the discharge for a discharge repetition frequency of 2.5 kHz and different duty cycles D. The mean ion current density , averaged over the whole period of the discharge, increased with decreasing D although the value of the mean discharge current was kept constant. A simple analytical model is proposed to explain this effect. It is shown that the observed rise in with decreasing D is in major part caused by the rise in the ion current in the afterglow region of the pulsed discharge.
    Trvalý link: http://hdl.handle.net/11104/0196554