Počet záznamů: 1

A study of plasma parameters in hollow cathode plasma jet in pulse regime

  1. 1.
    0357985 - FZU-D 2011 RIV DE eng J - Článek v odborném periodiku
    Kudrna, P. - Klusoň, J. - Leshkov, S. - Chichina, M. - Picková, I. - Hubička, Zdeněk - Tichý, M.
    A study of plasma parameters in hollow cathode plasma jet in pulse regime.
    Contributions to Plasma Physics. Roč. 50, č. 9 (2010), s. 886-891 ISSN 0863-1042
    Grant CEP: GA ČR GA202/09/0800
    Výzkumný záměr: CEZ:AV0Z10100522
    Klíčová slova: thin-films * system * deposition * RF * nitride
    Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
    Impakt faktor: 1.006, rok: 2010

    The pulsed DC hollow cathode discharge has been studied in the low pressure plasma jet sputtering system by means of cylindrical Langmuir probe. Measurements have been performed in pure Ar with the flow rate of 30 sccm.
    Trvalý link: http://hdl.handle.net/11104/0196140