Počet záznamů: 1

Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser

  1. 1.
    0352022 - FZU-D 2011 RIV US eng J - Článek v odborném periodiku
    Hau-Riege, S.P. - London, R.A. - Graf, A. - Baker, S. L. - Soufli, R. - Sobierajski, R. - Burian, Tomáš - Chalupský, Jaromír - Juha, Libor - Gaudin, J. - Krzywinski, J. - Moeller, S. - Messerschmidt, M. - Bozek, J. - Bostedt, C.
    Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser.
    Optics Express. Roč. 18, č. 23 (2010), s. 23933-23938 ISSN 1094-4087
    Grant CEP: GA AV ČR KAN300100702; GA MŠk LC510; GA MŠk(CZ) LC528; GA MŠk LA08024; GA AV ČR IAAX00100903; GA MŠk(CZ) ME10046; GA AV ČR IAA400100701
    Výzkumný záměr: CEZ:AV0Z10100523
    Klíčová slova: x-ray optics * optical materials * x-ray free electron laser
    Kód oboru RIV: BH - Optika, masery a lasery
    Impakt faktor: 3.749, rok: 2010

    Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
    Trvalý link: http://hdl.handle.net/11104/0191631