A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength

0350331 - FZÚ 2011 RIV DE eng J - Článek v odborném periodiku
Wachulak, P.W. - Bartnik, A. - Fiedorowicz, H. - Feigl, T. - Jarocki, R. - Kostecki, J. - Rudawski, P. - Sawicka, Magdalena - Szczurek, M. - Szczurek, A. - Zawadzki, Z.
A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength.
Applied Physics B-Lasers and Optics. Roč. 100, č. 3 (2010), 461-469. ISSN 0946-2171. E-ISSN 1432-0649
Výzkumný záměr: CEZ:AV0Z10100523
Klíčová slova: laser-plasma * EUV source * gas puff target * elliptical multi-layer * mirror * table-top setup
Kód oboru RIV: BH - Optika, masery a lasery
Impakt faktor: 2.239, rok: 2010

A compact, high-repetition table-top EUV source, based on a gas-puff target, is presented. This source was developed in our group and is capable of emitting quasimonochromatic radiation at 13.8 nm wavelength with the inverse relative bandwidth of 140 and pulse energies up to ~1.3 μJ/pulse at 10-Hz repetition rate. The source is debrisfree, operates near the lithographic wavelengths and offers the energy density of ~0.4 mJ/cm2 in each EUV pulse. These three features make the source attractive for lithographic experiments.
Trvalý link: http://hdl.handle.net/11104/0190359