Počet záznamů: 1

Enhancement of YBCO thin film thermal stability under 1 ATM oxygen pressure by Intermediate Cu.sub.2./sub. O nanolayer

  1. 1.
    0347871 - FZU-D 2011 RIV US eng J - Článek v odborném periodiku
    Cheng, L. - Wang, X. - Yao, X. - Wan, W. - Li, F.H. - Xiong, J. - Tao, B.W. - Jirsa, Miloš
    Enhancement of YBCO thin film thermal stability under 1 ATM oxygen pressure by Intermediate Cu2 O nanolayer.
    Journal of Physical Chemistry B. Roč. 114, č. 22 (2010), s. 7543-7547 ISSN 1520-6106
    Grant CEP: GA MŠk(CZ) ME10069
    Výzkumný záměr: CEZ:AV0Z10100520
    Klíčová slova: YBCO thin films * thermal stability * thin film growth orientation * temperature optical microscopy
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
    Impakt faktor: 3.603, rok: 2010

    The melting process of YBa2 Cu3 Ox (YBCO or Y123) films under oxygen atmosphere was observed in situ by means of high-temperature optical microscopy. The films were c-axis oriented, with two different in-plane orientations (denoted as 0 and 45°). In the 45°-oriented films, HRTEM detected an intermediate Cu2 O nanolayer in the vicinity of the interface. The thermal stability of the 45°-oriented YBCO films dramatically grew with increasing oxygen partial pressure.
    Trvalý link: http://hdl.handle.net/11104/0006036